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8506.30.50 - 8515.39.00
> 8514.10.40
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HTS Number:
8514.10.40
Description:
Resistance heated industrial or laboratory furnaces and ovens for the manufacture of semiconductor devices on semiconductor wafers
Previous Tariff (8514.10.00 - Resistance heated industrial or laboratory furnaces and ovens)
Next Tariff (8514.10.80 - Resistance heated industrial or laboratory furnaces and ovens, nesoi)
Related Rulings:
1997 NY B88599 - The tariff classification of resistance heated horizontal diffusion furnace systems for semiconductor wafers from England.
1998 HQ 961005 - NY 818472 and NY A81746 Revoked; Industrial Furnace for Diffusion, Oxidation or Annealing of Semiconductor Wafers, Subheading 8514.30.20; Other Resistance Heated Furnace; GRI 6
1998 HQ 961329 - NY 855845 Modified; Oxidation/Diffusion Furnace, Resistance Heated Furnace; Subheading 8514.30.20, Other Furnaces for Diffusion, Oxidation or Annealing of Semiconductor Wafers; GRI 6
1998 HQ 961330 - NY 862517 Modified; Oxidation/Diffusion Furnace, Resistance Heated Furnace; Subheading 8514.30.20, Other Furnaces for Diffusion, Oxidation or Annealing of Semiconductor Wafers; GRI 6
1998 HQ 961332 - NY A89407 Modified; Oxidation/Diffusion Furnace, Resistance Heated Furnace; Subheading 8514.30.20, Other Furnaces for Diffusion, Oxidation or Annealing of Semiconductor Wafers; GRI 6