United States International Trade Commision Rulings And Harmonized Tariff Schedule
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8446.30.50 - 8458.99.50
> 8456.91.00
Previous Tariff (8456.90.70 - Machine tool for working material (n/metal) removal of mat. operated by electro-chemical/electron-beam/ionic-beam/plasma arc processes,nesoi)
Next Tariff (8456.99.10 - Focused ion beam milling machines to produce or repair masks and reticles for patterns on semiconductor devices)
HTS Number:
8456.91.00
Description:
Machine tools for dry etching patterns on semiconductor materials by electro-chemical, electron-beam, ionic-beam or plasma arc processes
MFN Duty Rate:
Free
Previous Tariff (8456.90.70 - Machine tool for working material (n/metal) removal of mat. operated by electro-chemical/electron-beam/ionic-beam/plasma arc processes,nesoi)
Next Tariff (8456.99.10 - Focused ion beam milling machines to produce or repair masks and reticles for patterns on semiconductor devices)
Related Rulings:
1996 NY A83976 - The tariff classification of a Plasma Etching System from England.
1997 NY A89407 - The tariff classification of semiconductor production and test equipment from Japan.
1998 NY NY477 - The tariff classification of semiconductor production and test equipment from Japan.
2004 NY K86503 - The tariff classification of semiconductor manufacturing equipment from Japan